Peer Review History: Effect of HF Wave Frequency on N-atom Production in N2 HF Plasmas and Its Application in CN Thin Films Deposition

Approved by:

(1) Dr. Shridhar N. Mathad, KLE Institute of Technology, India.

Reviewers:

(1) Anitha Rexalin Devaraj, AMET Deemed to be University, India.

(2) Hadiqa Khan, NED University of Engineering & Technology (NEDUET), Pakistan.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Anitha Rexalin Devaraj, India) | File 1 | NA


Peer review report_2 (Hadiqa Khan, Pakistan) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Posted in Review History.