Peer Review History: N, H and C-atoms Concentrations in Flowing Afterglows of Microwave R/N2-H2 and R/N2-CH2 Discharges with R=N2, He, Ar and Their Applications to TiO2 Surface Nitriding

Approved by:

(1) Dr. Swarniv Chandra, Assistant Professor, Institute of Natural Sciences and Applied Technology, India.

Reviewers:

(1) Hazim Saad Jabbar Al-Maliki, College of Dentistry, University of Basrah, Iraq.

(2) Saba Zafar, National Center for Physics, Pakistan.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Hazim Saad Jabbar Al-Maliki, Iraq) | File 1 | NA


Peer review report_2 (Saba Zafar, Pakistan) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: A Detailed Comparison between RF and Microwave Afterglows in N2 Gas Mixtures for Surface Nitriding of TiO2 Films

Approved by:

(1) Dr. Shridhar N. Mathad, KLE Institute of Technology, India.

Reviewers:

(1) Vida Past, Tehran University of Medical Sciences, Iran.

(2) Mohammed Ubaid Hussein, University of Anbar, Iraq.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Vida Past, Iran) | File 1 | NA


Peer review report_2 (Mohammed Ubaid Hussein, Iraq) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: The Iron Nitriding in N2 and N2-H2 Afterglows

Approved by:

(1) Prof. Pratima Parashar Pandey, School of Science & Engineering, IILM University, India.

Reviewers:

(1) Siti Hasanah Binti Osman, Universiti Kebangsaan Malaysia, Malaysia.

(2) A. Renuka Prasad, Sai Rajeswari Institute of Technology, India.

(3) Mahadeva Reddy, Savitribai Pule Pune University, India.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Siti Hasanah Binti Osman, Malaysia) | File 1 | NA


Peer review report_2 (A. Renuka Prasad, India) | File 1 | NA


Peer review report_3 (Mahadeva Reddy, India) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: Effect of HF Wave Frequency on N-atom Production in N2 HF Plasmas and Its Application in CN Thin Films Deposition

Approved by:

(1) Dr. Shridhar N. Mathad, KLE Institute of Technology, India.

Reviewers:

(1) Anitha Rexalin Devaraj, AMET Deemed to be University, India.

(2) Hadiqa Khan, NED University of Engineering & Technology (NEDUET), Pakistan.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Anitha Rexalin Devaraj, India) | File 1 | NA


Peer review report_2 (Hadiqa Khan, Pakistan) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: N and C-atoms in R (Ar)-N2-CH4 Flowing Afterglows at High Pressure

Approved by:

(1) Prof. Pratima Parashar Pandey, School of Science & Engineering, IILM University, India.

Reviewers:

(1) Anitha Rexalin Devaraj, AMET Deemed to be University, India.

(2) Hussein Ali Kadhim Kyhoiesh, Iraq.

Additional Reviewers:

(1) Dharmendra H. Prajapati, Sankalchand Patel University, India.

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Anitha Rexalin Devaraj, India) | File 1 | NA


Peer review report_2 (Hussein Ali Kadhim Kyhoiesh, Iraq) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: Quantitative Evaluation of the Densities of Ar-N2 and N2 Flowing Afterglows at Atmospheric Gas Pressure

Approved by:

(1) Prof. Román Alvarez, National university of Mexico (UNAM), Mexico.

Reviewers:

(1) Aduloju Emmanuel I, Universiti Sains Malaysia, Malaysia.

(2) Afef Dhaffouli, University of Gafsa, Tunisia.

Additional Reviewers:

(1) Tarik EL Ouafy, Sultan Moulay Slimane University, Morocco.

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Aduloju Emmanuel I, Malaysia) | File 1 | NA


Peer review report_2 (Afef Dhaffouli, Tunisia) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: Determination of N-atom Density in High Ar- N2 Gas Pressure Microwave Afterglow

Approved by:

(1) Dr. Lei Zhang, Assistant Professor of Physics, Winston-Salem State University, USA.

Reviewers:

(1) Alex De Nazare De Oliveira, Universidade Federal Do Amapá, Brazil.

(2) M. Govindarajan, Pondicherry University, India.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Alex De Nazare De Oliveira, Brazil) | File 1 | NA


Peer review report_2 (M. Govindarajan, India) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: Effect of O2 into N2 Afterglows in RF and Corona Discharges

Approved by:

(1) Dr. Hao-Yang Wang, Associate Professor, Shanghai Institute of Organic Chemistry, China.

Reviewers:

(1) Radhika T. P, Indian Institute of Technology Delhi, India.

(2) Valentino Straser, Brussel.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Radhika T. P, India) | File 1 | NA


Peer review report_2 (Valentino Straser, Brussel) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: Measuring the Density of N2 Active Species in N2 –xCH4 Afterglows with x= (0-7.5)10-4 by Mass Spectrometry and Optical Spectroscopy at Low Gas Pressure

Approved by:

(1) Dr. Abhik Kumar Sanyal (Retd.), Associate Professor, Jangipur College, University of Kalyani, India.

Reviewers:

(1) Anitha Rexalin Devaraj, AMET Deemed to be University, India.

(2) Rafik Abdellatif, Morocco.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Anitha Rexalin Devaraj, India) | File 1 | NA


Peer review report_2 (Rafik Abdellatif, Morocco) | File 1 | NA


Re-review report_2 (Rafik Abdellatif, Morocco) | File 1 | NA


Comment_Academic_Editor | File 1 | NA


Peer Review History: Characterization of N and O-atoms, of N2(A) and N2(X,v>13) Metastable Molecules and N2+ ion Densities in Ar-N2 Afterglows Plasmas from Microwave Discharges

Approved by:

(1) Dr. Francisco Welington de Sousa Lima, Universidade Federal do Piauí, Brazil.

Reviewers:

(1) Rahmad Oktafiansyah, Lambung Mangkurat University, Indonesia.

(2) Niyazi A. S. Al-Areqi, Taiz University, Yemen.

Additional Reviewers:

Additional Reviewers: (Comments received after deadline)

Peer Review History:


Peer review report_1 (Rahmad Oktafiansyah, Indonesia) | File 1 | NA


Peer review report_2 (Niyazi A. S. Al-Areqi, Yemen) | File 1 | NA


Comment_Academic_Editor | File 1 | NA